Product Name:4-BOC-styrene

IUPAC Name:tert-butyl 4-ethenylphenyl carbonate

CAS:87188-51-0
Molecular Formula:C13H16O3
Purity:95%+
Catalog Number:CM542093
Molecular Weight:220.27

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CM542093-25g in stock șƄ
CM542093-100g in stock źňƄ

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Product Details

CAS NO:87188-51-0
Molecular Formula:C13H16O3
Melting Point:-
Smiles Code:O=C(OC1=CC=C(C=C)C=C1)OC(C)(C)C
Density:
Catalog Number:CM542093
Molecular Weight:220.27
Boiling Point:
MDL No:
Storage:

Category Infos

Photoresist
Semiconductors could be termed as the most extensively utilized substance in the modern century. Polycrystalline wafers are used to make semiconductors. A single 300-mm silicon wafer may create hundreds of chips. Photoresist coatings and materials are an essential part of their fabrication as they are the main constituents of the photolithography process during the fabrication of the semiconductors. Photoresist is a mixed liquid that is sensitive to light. Its components include: photoinitiators (including photosensitizers, photoacid generators), photoresist resins, monomers, solvents and other additives. The photoresist can transfer the required fine pattern from the photomask (mask) to the substrate to be processed through photochemical reaction and photolithography processes such as exposure and development.

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