Product Name:Anthracen-9-ylmethyl methacrylate

IUPAC Name:(anthracen-9-yl)methyl 2-methylprop-2-enoate

CAS:31645-35-9
Molecular Formula:C19H16O2
Purity:95%
Catalog Number:CM283052
Molecular Weight:276.34

Packing Unit Available Stock Price($) Quantity
CM283052-10g in stock ǟǟ
CM283052-25g in stock ţţǎ
CM283052-100g in stock ŽŽǟ

For R&D use only.

Inquiry Form

   refresh    

Product Details

CAS NO:31645-35-9
Molecular Formula:C19H16O2
Melting Point:-
Smiles Code:CC(C(OCC1=C2C=CC=CC2=CC3=CC=CC=C13)=O)=C
Density:
Catalog Number:CM283052
Molecular Weight:276.34
Boiling Point:443°C at 760 mmHg
MDL No:MFCD00673247
Storage:Store at 2-8°C.

Category Infos

Anthracenes
Anthracene is a condensed aromatic hydrocarbon containing three rings. The center of the three rings of anthracene is in a straight line, which is the isomer of phenanthrene. The chemical activity of the 9 and 10 positions in the anthracene molecule is relatively high. It is oxidized with nitric acid to generate 9, 10-anthraquinone, which is an important intermediate for the synthesis of anthraquinone dyes. Anthracene can also act as a conjugated diene in a Diels-Alder reaction with maleic anhydride.
Photoresist
Semiconductors could be termed as the most extensively utilized substance in the modern century. Polycrystalline wafers are used to make semiconductors. A single 300-mm silicon wafer may create hundreds of chips. Photoresist coatings and materials are an essential part of their fabrication as they are the main constituents of the photolithography process during the fabrication of the semiconductors. Photoresist is a mixed liquid that is sensitive to light. Its components include: photoinitiators (including photosensitizers, photoacid generators), photoresist resins, monomers, solvents and other additives. The photoresist can transfer the required fine pattern from the photomask (mask) to the substrate to be processed through photochemical reaction and photolithography processes such as exposure and development.

Related Products